Impact of planarization sheet addition on full wafer printing uniformity

Tanguy Lévéder (1) , Stéfan Landis (1) , Laurent Davoust (2) , Nicolas Chaix (3)

1 CEA-LETI - Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information
2 LEGI - Laboratoire des Écoulements Géophysiques et Industriels [Grenoble]
3 LTM - Laboratoire des technologies de la microélectronique

Uniformity of nanoimprint lithography has been quantitatively studied through the ability to replicate regular lines arrays by wafer-to-wafer imprint. Two statistic coefficients have been defined in order to quantify the local uniformity and the ability to identically imprint two similar areas respectively. Those coefficients enable to compare different imprint profiles in terms of uniformity and to point out the efficiency of soft layers insertion into the imprint stack.

Domaines: Micro et nanotechnologies/Microélectronique; Mécanique des fluides [physics.class-ph]

Tanguy Lévéder, Stéfan Landis, Laurent Davoust, Nicolas Chaix. Impact of planarization sheet addition on full wafer printing uniformity. MRS Online Proceedings Library, 2007, Symposium O – Nanostructured and Patterned Materials for Information Storage, 961, pp.0961-O02-06. ⟨10.1557/PROC-0961-O02-06⟩. ⟨hal-00266800⟩