Carboxylic acids as oxygen sources for the atomic layer deposition of high-k metal oxides

E. Rauwel , M.-G. Wllinger , F. Ducroquet (1) , P. Rauwel , I. Matko , D. Kiselev (2) , I. K. Bdikin , N. Pinna

1 IMEP-LAHC - Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation
2 Department of Ceramics and Glass Engineering & CICECO

Domaines: Micro et nanotechnologies/Microélectronique

E. Rauwel, M.-G. Wllinger, F. Ducroquet, P. Rauwel, I. Matko, et al.. Carboxylic acids as oxygen sources for the atomic layer deposition of high-k metal oxides. Journal of Physical Chemistry C, 2008, 112 (33,12754-12759). ⟨hal-00391670⟩