Carboxylic Acids as Oxygen Supplying Agents for Atomic Layer Deposition of High-k Thin Films

E. Rauwel , F. Ducroquet (1) , P. Rauwel , M.-G. Willinger , I. Matko , D. Kiselev (2) , N. Pinna

1 IMEP-LAHC - Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation
2 Department of Ceramics and Glass Engineering & CICECO

Domaines: Micro et nanotechnologies/Microélectronique

E. Rauwel, F. Ducroquet, P. Rauwel, M.-G. Willinger, I. Matko, et al.. Carboxylic Acids as Oxygen Supplying Agents for Atomic Layer Deposition of High-k Thin Films. Pacific Rim Meeting on Electrochemical and Solid-State Science, Joint Meeting (214th Meeting of the Electrochemical Soc. and 2008 Fall Meeting of the Electrochemical Soc. of Japan),, Symposium: E2 - Atomic Layer Deposition, Honolulu, Hawaii,, Oct 2008, France, France. ⟨hal-00392109⟩