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hal-00392120v1  Conference papers
C. DubourdieuV. BrizéJ. UbrigS. MargueronI. Matko et al.  HfO2-based solid solutions for high-k/metal gate stack properties improvement
Invited paper, 15th Workshop on Dielectrics in Microelectronics, Berlin,, Jun 2008, xx, France
hal-00392103v1  Conference poster
E. RauwelF. DucroquetP. RauwelM.-G. WillingerI. Matko et al.  Carboxylic acids as oxygen supplying agents for ALD of high k thin films
8th International Conference on Atomic Layer Deposition,, Jun 2008, Bruges, Belgium. 2008
hal-00392116v1  Conference papers
E. RauwelG. ClavelM.G. WillingerP. RauwelF. Ducroquet et al.  Non-aqueous Sol-Gel routes applied to atomic layer deposition
NanoSpain, Braga, Portugal, Apr 2008, Braga, Portugal
hal-00391670v1  Journal articles
E. RauwelM.-G. WllingerF. DucroquetP. RauwelI. Matko et al.  Carboxylic acids as oxygen sources for the atomic layer deposition of high-k metal oxides
Journal of Physical Chemistry C, American Chemical Society, 2008, 112 (33,12754-12759)
hal-00603716v1  Conference papers
C. DubourdieuE. RauwelY. LaiO. SalicioA. Klein et al.  Synthesis by CVD and characterisation of nanoscale functional films and 1D structures
Conference workbook, symp H2.1, Jun 2009, Strasbourg, France
hal-00604733v1  Conference papers
E. RauwelP. RauwelF. DucroquetI. MatkoA. Lourenço. Metallic oxygen barrier diffusion applied to high-k deposition WODIM
16th Workshop on Dielectric Materials, Jun 2010, Bratislava, Slovakia
hal-00392109v1  Conference papers
E. RauwelF. DucroquetP. RauwelM.-G. WillingerI. Matko et al.  Carboxylic Acids as Oxygen Supplying Agents for Atomic Layer Deposition of High-k Thin Films
Pacific Rim Meeting on Electrochemical and Solid-State Science, Joint Meeting (214th Meeting of the Electrochemical Soc. and 2008 Fall Meeting of the Electrochemical Soc. of Japan),, Symposium: E2 - Atomic Layer Deposition, Honolulu, Hawaii,, Oct 2008, France, France
hal-01067590v1  Journal articles
C. DubourdieuE. RauwelHervé RousselF DucroquetB. Hollander et al.  Addition of yttrium into HfO2 films: Microstructure and electrical properties
Journal of Vacuum Science & Technology A, American Vacuum Society, 2009, 27 (3), pp.503-514. ⟨10.1116/1.3106627⟩
hal-00391673v1  Journal articles
E. RauwelF. DucroquetP. RauwelM.-G. WillingerI. Matko et al.  Carboxylic Acids as Oxygen Supplying Agents for Atomic Layer Deposition of High-k Thin Films
ECS Transactions, Electrochemical Society, Inc., 2008, 16 (4, 279-289)
hal-00392123v1  Conference papers
E. RauwelF. DucroquetG. ClavelP. RauwelM.-G. Willinger et al.  ALD of High-k thin films using carboxylic acids as oxygen supplying agents
15th Workshop on Dielectrics in Microelectronics,, Jun 2008, Berlin, Germany. pp.93