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hal-00486182v1  Conference papers
X. DetterL. VallierG. CungeO. Joubert. Gate Etching for ULSI Technology : Critical Dimension Control in the sub 0.1 µm regime
AVS, 48th International AVS symposium & Topical conferences, 2001, San Francisco, United States
hal-00486306v1  Conference papers
G. CungeM. KogelschatzN. SadeghiL. VallierO. Joubert. Plasma-wall interaction studies during gate etch processes
AVS, 49th International AVS Symposium & Topical Conferences, 2002, Denver, United States
hal-00481950v1  Conference papers
G. CungeJ. FoucherL. VallierO. Joubert. Plasma etching of nano-scale feature in Silicon : application to ultimate CMOS gates and quantum nanowires
ISPC, 15th International Symposium on Plasma Chemistry, 2001, Orléans, France
hal-00488334v1  Conference papers
T. SpraksS. RaufG. CungeL. Vallier. An isotropic SiGe etch process for the fabrication of Silicon On nothing transistors
AVS, 51st International AVS Symposium, 2004, Anaheim, United States
hal-00494528v1  Conference papers
J.P BoothH. AbadaP. ChabertG. Cunge. CFX kinetics, gas temperature and instabilities in a CF4 inductively coupled discharge
48th National AVS symposium & Topical conferences, 2001, San Francisco, United States
hal-00390367v1  Conference papers
P. VoisinM. ZelsmannC. GourgonJ. Boussey-SaidG. Cunge. High resolution UV-Nanoimprinting using thin hard quartz moulds
Electron, Ion, and Photon Beam technology and Nanofabrication conference - EIPBN 2006-, May 2006, Baltimore, United States
hal-00944902v1  Journal articles
G. CungeD. VempaireN. Sadeghi. Gas convection caused by electron pressure variations in pulsed discharge
Applied Physics Letters, American Institute of Physics, 2010, 13, pp.131501. ⟨10.1063/1.3368124⟩
hal-00397072v1  Journal articles
R. RamosG. CungeO. R. Joubert. On the interest of carbon-coated plasma reactor for advanced gate stack etching processes
J. Vac. Sci. Technol. A 25, (2007), 290-303, 2007, pp.J. Vac. Sci. Technol. A 25, (2007), 290-303
hal-00384286v1  Journal articles
G. CungeD. VempaireM. TouzeauN. Sadeghi. Broad-Band and time-resolved absorption spectroscopy with UV-LEDs : application to etching plasma monitoring
Applied Physics Letters, American Institute of Physics, 2007, pp.91, 231503
hal-00388592v1  Journal articles
G. CungeR. RamosD. VempaireM. TouzeauM. Nejbauer et al.  Gas temperature measurement in HBr, Cl2, SF6, CF4 and O2 plasmas
Journal of Vacuum Science and Technology, American Vacuum Society (AVS), 2009, pp.A 27 (3), (2009), 471-478
hal-00808842v1  Conference papers
M. BrihoumK. MengueltiG. CungeE. PargonO. Joubert. Impact of synchronized pulsed conditions on HBr cure to LWR reduction and etch resistance improvement of 193 nm photoresist
Plasma Etch and Strip in Microelectronics (PESM), 5th International Workshop, Mar 2012, Grenoble, France
hal-00946840v1  Conference papers
S. ArchambaultM. SalaünC. GirardotM. DelalandeG. Cunge et al.  PS-b-PDMS graphoepitaxy in trilayer 193 nm photolithography patterns and transfer etching
Micro- and Nano-Engineering conference- MNE 2013, Sep 2013, Londres, United Kingdom
hal-00397771v1  Conference papers
O. R. JoubertE. PargonG. CungeT. ChevolleauB. Pelissier et al.  Plasma etching challenges involved in gate stack patterning for 45 nm technological nodes and beyond
1st workshop on plasma etch and strip in microelectronic (PESM), 2007, Louvain, Belgium
hal-00461118v1  Conference papers
B. SalhiC. AgraffeilT. BaronM. KogelschatzG. Cunge et al.  Elaboration and integration of auto-organized nanostructures for nanoelectronics applications Make toward nanowires transistor
GdR Nanofils et Nanotubes Semiconducteurs – Workshop 2009, 2009, Autrans, France
hal-00643917v1  Conference papers
E. PargonG. CungeMaxime DarnonL. VallierP. Bodart et al.  Plasma etching processes for nanoCMOS and nanoelectronics devices
Minatech upstream crossroad, 2010, Grenoble, France
hal-00685135v1  Conference papers
G. CungeJ. FoucherD. FuardL. VallierO. Joubert et al.  Mass spectrometry as tool for plasma etching charactérization
XV europhysics conference on atomic and molecular physics of ionised gases, Aug 2000, Miskolc, Hungary
hal-00623374v1  Journal articles
C. Petit-EtienneMaxime DarnonL. VallierE. PargonG. Cunge et al.  Reducing damage to Si substrates during gate etching processes by synchronous plasma pulsing
Journal of Vacuum Science and Technology, American Vacuum Society (AVS), 2010, doi: 10.1116/1.3483165, pp.B 28, (2010), 926-935
hal-00944937v1  Conference papers
E. PargonG. CungeMaxime DarnonL. VallierP. Bodart et al.  Pulsed plasmas for nanoCMOS and nanoelectronics devices elaboration
2nd International Conference on Plasma Nanoscience (iPlasma Nano-II), 2010, Bateman's Bay, Australia
hal-00944924v1  Journal articles
C. Petit-EtienneMaxime DarnonP. BodartM. FouchierG. Cunge et al.  Atomic-scale silicon etching control using pulsed Cl-2 plasma
Journal of Vacuum Science and Technology B, 2013, 31 (1), pp.011201. ⟨10.1116/1.4768717⟩
hal-00647616v1  Conference papers
Maxime DarnonC. Petit-EtienneE. PargonG. CungeL. Vallier et al.  Synchronous Plasma Pulsing for Etch Applications
China Semiconductor Technology International Conference (CSTIC), Mar 2010, Shanghaï, China