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hal-00391670v1  Journal articles
E. RauwelM.-G. WllingerF. DucroquetP. RauwelI. Matko et al.  Carboxylic acids as oxygen sources for the atomic layer deposition of high-k metal oxides
Journal of Physical Chemistry C, American Chemical Society, 2008, 112 (33,12754-12759)
hal-00392103v1  Conference poster
E. RauwelF. DucroquetP. RauwelM.-G. WillingerI. Matko et al.  Carboxylic acids as oxygen supplying agents for ALD of high k thin films
8th International Conference on Atomic Layer Deposition,, Jun 2008, Bruges, Belgium. 2008
hal-00392116v1  Conference papers
E. RauwelG. ClavelM.G. WillingerP. RauwelF. Ducroquet et al.  Non-aqueous Sol-Gel routes applied to atomic layer deposition
NanoSpain, Braga, Portugal, Apr 2008, Braga, Portugal
hal-00604733v1  Conference papers
E. RauwelP. RauwelF. DucroquetI. MatkoA. Lourenço. Metallic oxygen barrier diffusion applied to high-k deposition WODIM
16th Workshop on Dielectric Materials, Jun 2010, Bratislava, Slovakia
hal-00392109v1  Conference papers
E. RauwelF. DucroquetP. RauwelM.-G. WillingerI. Matko et al.  Carboxylic Acids as Oxygen Supplying Agents for Atomic Layer Deposition of High-k Thin Films
Pacific Rim Meeting on Electrochemical and Solid-State Science, Joint Meeting (214th Meeting of the Electrochemical Soc. and 2008 Fall Meeting of the Electrochemical Soc. of Japan),, Symposium: E2 - Atomic Layer Deposition, Honolulu, Hawaii,, Oct 2008, France, France
hal-00391673v1  Journal articles
E. RauwelF. DucroquetP. RauwelM.-G. WillingerI. Matko et al.  Carboxylic Acids as Oxygen Supplying Agents for Atomic Layer Deposition of High-k Thin Films
ECS Transactions, Electrochemical Society, Inc., 2008, 16 (4, 279-289)
hal-00392123v1  Conference papers
E. RauwelF. DucroquetG. ClavelP. RauwelM.-G. Willinger et al.  ALD of High-k thin films using carboxylic acids as oxygen supplying agents
15th Workshop on Dielectrics in Microelectronics,, Jun 2008, Berlin, Germany. pp.93