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hal-00385816v1  Conference papers
R. PelzerT. GlinsnerF. LindnerO. BobenstetterC. Gourgon et al.  Nanoimprint lithography on 200 mm full printed wafer
MINATEC 2003, 2003, grenoble, France
hal-00488305v1  Conference papers
C. GourgonC. PerretF. LazzarinoJ. TallalR. Pelzer et al.  8'' wafers printed by nanoimprint lithography: uniformity and mold deformation
Nanoimprint and Nanoprint Technology Conference, 2003, Boston, United States
hal-00488327v1  Conference papers
N. ChaixC. GourgonC. PerretS. Landis. NIL on 8'' wafers : the impact of the polymer properties
Nanoimprint and Nanoprint Technology Conference, 2004, Vienne, Austria
hal-00390372v1  Conference papers
N. ChaixC. GourgonC. PerretS. LandisT. Leveder. Pattern transfer on 200 mm Si wafer for optical applications
Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), May 2007, denver, United States
hal-00390373v1  Conference papers
T. LevederS. LandisL. DavoustS. SoulanJ.H. Tortai et al.  Surface characterization of imprinted resist above glass transition temperature
Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), May 2007, Denver, United States
hal-00397051v1  Journal articles
J. ThiaultJ. FoucherJ.H. TortaiO. JoubertS. Landis et al.  Line edge roughness characterization with a three dimensional atomic force microscope: Transfer during gate patterning processes
Journal of Vacuum Science and Technology, American Vacuum Society (AVS), 2005, pp.B 23 3075-3079
hal-00394500v1  Journal articles
N. ChaixC. GourgonC. PerretS. DecossasS. Landis et al.  NIL processes and material characterization on transparent subtrates for optical applications
Journal of Vacuum Science and Technology, American Vacuum Society (AVS), 2008, pp.B, 26, 6 - 2174-2178
hal-00387292v1  Conference papers
C. GourgonN. ChaixS. LandisM. ZelsmannJ. Boussey et al.  Impact of the cycle time on the pattern filling and uniformity in thermal Nanoimprint lithography.
Nanoprint and Nanoimprint Technology, NNT2006, 2006, san francisco, United States
hal-00388778v1  Conference papers
S. LandisN. ChaixD. HermelinT. LevederC. Gourgon. Capillary bridges growth investigation in NIL process
NNT 2006, 2006, san francisco, United States
hal-00385807v1  Conference papers
C. GourgonC. PerretF. LazzarinoJ.H. TortaiG. Micouin et al.  The influence of residual solvent in polymers patterned by NanoImprint Lithography
Nanoimprint and Nanoprint Technology Conference,, 2002, San francisco, United States
hal-00390379v1  Conference papers
C. GourgonC. PerretN. ChaixS. LandisS. Garcia et al.  Comparison of the behaviour of nanoimprint resists during etching processes
Conference on Nanoimprint and Nanoprint Technology (NNT), Oct 2007, Paris, France
hal-00390384v1  Conference papers
N. ChaixC. GourgonC. PerretS. DecossasS. Landis et al.  NIL processes and material characterization on transparent substrates for optical applications
Electron, Ion, and Photon Beam technology and Nanofabrication conference - EIPBN 2008, 2008, Portland, United States
hal-00385736v1  Journal articles
C. GourgonC. PerretJ. TallalF. LazzarinoS. Landis et al.  Uniformity across 200 mm silicon wafers printed by nanoimprint lithography
Journal of Physics D: Applied Physics, IOP Publishing, 2005, pp.38 (1) 2005 70-73
hal-00385748v1  Journal articles
N. ChaixS. LandisD. HermelinT. LevederC. Perret et al.  Influence of mold depth on capillary bridges in nanoimprint lithography
J. Vac. Sci Technol., 2006, B Nov/Dec (24(6)), pp.3011-3015
hal-00385729v1  Journal articles
S. LandisS. PauliacJ. Saint PolC. GourgonM. Akita et al.  High resolution hybrid lithography with negative tone chemically amplified resists
Jap. J. Appl. Phys., 2004, Vol. 43 ((6B)), pp.3974-3980
hal-00488322v1  Conference papers
C. GourgonC. PerretS. LandisF. LazzarinoJ. Tallal et al.  Nanoimprint lithography on 8'' wafers : resolution and uniformity
Ultimate Lithography and Nanodevice Engineering Conference, 2004, la londe, France
hal-00385907v1  Conference papers
N. ChaixC. GourgonC. PerretR. GraillotS. Landis et al.  200mm NIL : process improvement using polymer surface modification by plasma treatment
Nanoimprint and Nanoprint Technology Conference,, 2005, nara, Japan
hal-00385794v1  Journal articles
C. GourgonN. ChaixH. SchiftM. TormenS. Landis et al.  Benchmarking of 50 nm features in thermal Nanoimprint
Journal of Vacuum Science and Technology, American Vacuum Society (AVS), 2007, pp.B 25 (6) 2373-2378
hal-00486228v1  Conference papers
S. LandisJ. FoucherT. LevederC. PerretN. Chaix et al.  Full 8'' printed wafer 3D resist characterizations by Critical Dimension Atomic Force Microscopy
Nanoimprint and Nanoprint Technology Conference, 2005, Nara, Japan
hal-00398852v1  Conference papers
J. ThiaultJ. FoucherJ.H. TortaiG. CungeO. Joubert et al.  Exploration of ultimate gate patterning technologies: lithography and plasma etching
15th International Colloquium on Plasma Processes (CIP), 2005, autrans, France
hal-00385753v1  Journal articles
N. ChaixS. LandisC. GourgonS. MerinoV. Lambertini et al.  Nanoimprinting lithography on 200 mm wafers for optical applications
Microelectronic Engineering, Elsevier, 2007, pp.84 880-884
hal-00385731v1  Journal articles
C. PerretC. GourgonF. LazzarinoJ. TallalS. Landis et al.  Characterization of 8 inch wafers printed by Nanoimprint Lithography
Microelectronic Engineering, Elsevier, 2004, 73-74, pp.172-177
hal-00385728v1  Journal articles
C. GourgonJ.H. TortaiF. LazzarinoC. PerretG. Micouin et al.  The influence of residual solvent in polymers patterned by Nanoimprint Lithography
Journal of Vacuum Science and Technology, American Vacuum Society (AVS), 2004, pp.B 22 (2) (2004) 602-606
hal-00390381v1  Conference papers
N. ChaixC. GourgonS. LandisC. PerretJ.H. Tortai et al.  New curing polymer for thermal nanoimprint lithography and mold duplication
Conference on Nanoimprint and Nanoprint Technology (NNT), Oct 2007, Paris, France
hal-00456010v1  Conference papers
C. GourgonA. BéduerS. LandisC. PerretN. Chaix et al.  Study of the behavior of monomers in thermal nanoimprint lithography
Micro- and Nano-Engineering conference- MNE 2009, 2009, Ghent, Belgium