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hal-00672078v1  Conference papers
Didier Chaussende. Recent advances on SiC bulk growth processes
Confidential, Nov 2011, Pohang, South Korea
hal-00669461v1  Conference papers
C. Vallee. OxRAM and PCRAM devices
Korea Institute of Science and Technology (KIST), Jun 2010, Séoul, South Korea
hal-00669465v1  Conference papers
C. Vallee. Intégration des procédés plasmas froids dans l'énergie
Journée Du réseau plasma froid, plasma froid et énergie, Dec 2010, Grenoble, France
hal-00669437v1  Journal articles
A. LacosteStéphane BéchuY. ArnalJean PelletierCorentin Vallée et al.  Nitrogen profiles in materials implanted via plasma-based ion implantation
Surface and Coatings Technology, Elsevier, 2002, 156, pp.125-130
hal-00475794v1  Journal articles
L. DesvoiresL. VallierO. Joubert. X-ray photoelectron Spectroscopy investigation of sidewall passivation films formed during gate etch processes
Journal of Vacuum Science and Technology, American Vacuum Society (AVS), 2001, B19 (2), pp.420
hal-00394536v1  Conference papers
V. ReboudP. LoveraN. KehagiasM. ZelsmannM. Fink et al.  Polymer photonic crystal band edge laser fabricated by nanoimprint lithography
Conference on Lasers and Electro-Optics - CLEO Europe 2007, 2007, munich, Germany
hal-00394674v1  Journal articles
P. GononA. Boudefel. Electrical properties of epoxy / silver nanocomposites
Journal of Applied Physics, American Institute of Physics, 2006, pp.99, 024308
hal-00394748v1  Journal articles
J. TallalM. GordonK. BertonA.L CharleyD. Peyrade. AFM characterization of anti-sticking layers used in nanoimprint
Microelectronic Engineering, Elsevier, 2006, pp.83 (2006) 851-854
hal-00397708v1  Conference papers
B. Cabon. Convergence between future wireless and photonic communication systems
Conference on Design of Circuits and Integrated Systems, DCIS 2008, Nov 2008, France, France
hal-00397790v1  Conference papers
H. IssaD. KaddourM. AbdelazizFlorence PodevinEmmanuel Pistono et al.  Low-loss slow-wave shielded coplanar waveguides for RFIC applications
23rd Conference on Design of Circuits and Integrated Systems (DCIS, Nov 2008, -, France
hal-00477274v1  Journal articles
J.H. Tortai. Modeling of ultra thin resist films structure after spin-coating and post-applied bake
Microelectronic Engineering, Elsevier, 2004, Volumes 73-74, pp.Pages 223-227
hal-00475891v1  Journal articles
L. MollardG. CungeS. TedescoB. DalzottoJ. Foucher. HSQ hybrid lithography for 20 nm CMOS devices development
Microelectronic Engineering, Elsevier, 2002, pp.61-62, 755
hal-00397007v1  Conference papers
E. RossittoD. PeyradeP. Reiss. Assembly of shape-controlled CdSe nanocrystals
2th International Meeting on Molecular Electronics Meeting, 2006, GRENOBLE, France
hal-00397011v1  Conference papers
T. Pinedo-RiveraJ. TallalM. GordonD. VempaireC. Ternon et al.  Dynamic study and control of gold colloidal drop evaporation
TNT Trends in Nanotechnology, 2006, Grenoble, France
hal-00396877v1  Conference papers
K. FoubertE. PicardB. CluzelD. PeyradeF. de Fornel et al.  Strong light confinement in ultra high Q air-slot coupled SOI nanocavities
PECS VIII The 8th International Photonic & Electromagnetic Crystal Structures Meeting, 2009, Sydney, Australia
hal-00397047v1  Journal articles
G. CungeM. KogelschatzO. JoubertN. Sadeghi. Plasma - wall interactions during silicon etching processes in high-density HBr/Cl2/O2 plasmas
Plasma Sources Science and Technology, IOP Publishing, 2005, 14, pp.S42-S52
hal-00397102v1  Journal articles
R. RamosG. CungeO. R. Joubert. Plasma reactor dry cleaning strategy after TiN, TaN and HfO2 etching processes
Journal of Vacuum Science and Technology, American Vacuum Society (AVS), 2008, pp.B 26 (1), (2008), 181-188
hal-00397117v1  Journal articles
D. VempaireG. Cunge. Probing radical kinetics in the afterglow of pulsed discharges by absorption spectroscopy with LED: application to BCl radical
Applied Physics Letters, American Institute of Physics, 2009, pp.94, (2009), 21504
hal-00397119v1  Conference papers
G. CungeR. RamosO. R. JoubertN. SadeghiM. Mori. Plasma/reactor wall interactions in gate etching processes
27th International symposium on dry process (DPS), 2005, jeju, South Korea