Correlation between plasma chemistry, microstructure and electronic properties of Si:H thin films prepared by hydrogen dilution

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https://hal-supelec.archives-ouvertes.fr/hal-00321015
Contributor : Olivier Schneegans <>
Submitted on : Friday, September 12, 2008 - 10:01:34 AM
Last modification on : Monday, December 17, 2018 - 1:33:14 AM

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  • HAL Id : hal-00321015, version 1

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P. Chaudhuri, D. Das, P.P. Ray, Namita Dutta Gupta, Dhananjoy Roy, et al.. Correlation between plasma chemistry, microstructure and electronic properties of Si:H thin films prepared by hydrogen dilution. Journal of Non-Crystalline Solids, Elsevier, 2004, 338-340, pp.236. ⟨hal-00321015⟩

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