Correlation between plasma chemistry, microstructure and electronic properties of Si:H thin films prepared by hydrogen dilution

P. Chaudhuri; D. Das; P.P. Ray; Namita Dutta Gupta; Dhananjoy Roy; Christophe Longeaud

Journal articles

Correlation between plasma chemistry, microstructure and electronic properties of Si:H thin films prepared by hydrogen dilution

P. Chaudhuri D. Das P.P. Ray Namita Dutta Gupta ¹ Dhananjoy Roy ¹ Christophe Longeaud ¹

1 LGEP - Laboratoire de génie électrique de Paris

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Journal articles

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https://hal-supelec.archives-ouvertes.fr/hal-00321015
Contributor : Olivier Schneegans <>
Submitted on : Friday, September 12, 2008 - 10:01:34 AM
Last modification on : Monday, December 17, 2018 - 1:33:14 AM

Correlation between plasma chemistry, microstructure and electronic properties of Si:H thin films prepared by hydrogen dilution

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Correlation between plasma chemistry, microstructure and electronic properties of Si:H thin films prepared by hydrogen dilution

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