Study of a-C:H films deposited from methane-argon mixture on the grounded and rf powered electrodes of a rf-PECVD Unit - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2005

Study of a-C:H films deposited from methane-argon mixture on the grounded and rf powered electrodes of a rf-PECVD Unit

Fichier non déposé

Dates et versions

hal-00321566 , version 1 (15-09-2008)

Identifiants

  • HAL Id : hal-00321566 , version 1

Citer

Namita Dutta Gupta, Christophe Longeaud, A. Bhaduri, P. Chaudhuri. Study of a-C:H films deposited from methane-argon mixture on the grounded and rf powered electrodes of a rf-PECVD Unit. 13th International Workshop on the Physics of Semiconductor Devices, 2005, India. ⟨hal-00321566⟩
24 Consultations
0 Téléchargements

Partager

Gmail Facebook X LinkedIn More