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Study of a-C:H films deposited from methane-argon mixture on the grounded and rf powered electrodes of a rf-PECVD Unit

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https://hal-supelec.archives-ouvertes.fr/hal-00321566
Contributor : Olivier Schneegans <>
Submitted on : Monday, September 15, 2008 - 12:24:09 PM
Last modification on : Wednesday, October 21, 2020 - 2:01:17 PM

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  • HAL Id : hal-00321566, version 1

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Namita Dutta Gupta, Christophe Longeaud, A. Bhaduri, P. Chaudhuri. Study of a-C:H films deposited from methane-argon mixture on the grounded and rf powered electrodes of a rf-PECVD Unit. 13th International Workshop on the Physics of Semiconductor Devices, 2005, India. ⟨hal-00321566⟩

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