Some Properties of amorphous carbon films deposited on the grounded electrode of a RF-PECVD reactor from Ar-CH4 mixtures

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https://hal-supelec.archives-ouvertes.fr/hal-00321707
Contributor : Olivier Schneegans <>
Submitted on : Monday, September 15, 2008 - 4:52:59 PM
Last modification on : Thursday, November 22, 2018 - 2:35:22 PM

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  • HAL Id : hal-00321707, version 1

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Namita Dutta Gupta, Christophe Longeaud, P. Chaudhuri, A. Bhaduri, S. Vignoli. Some Properties of amorphous carbon films deposited on the grounded electrode of a RF-PECVD reactor from Ar-CH4 mixtures. 21st International Conference on Amorphous and Nanocrystalline Semiconductors, 2005, Portugal. ⟨hal-00321707⟩

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