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Some Properties of amorphous carbon films deposited on the grounded electrode of a RF-PECVD reactor from Ar-CH4 mixtures

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https://hal-supelec.archives-ouvertes.fr/hal-00321726
Contributor : Olivier Schneegans <>
Submitted on : Monday, September 15, 2008 - 5:22:04 PM
Last modification on : Wednesday, October 21, 2020 - 2:01:35 PM

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  • HAL Id : hal-00321726, version 1

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Namita Dutta Gupta, Christophe Longeaud, P. Chaudhuri, A. Bhaduri, S. Vignoli. Some Properties of amorphous carbon films deposited on the grounded electrode of a RF-PECVD reactor from Ar-CH4 mixtures. Journal of Non-Crystalline Solids, Elsevier, 2006, 352, pp.1307-1309. ⟨hal-00321726⟩

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