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Effect of thermal coupling on the electronic properties of hydrogenated amorphous silicon thin films deposited by ECR

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https://hal-supelec.archives-ouvertes.fr/hal-00322079
Contributor : Olivier Schneegans <>
Submitted on : Tuesday, September 16, 2008 - 3:55:12 PM
Last modification on : Wednesday, November 6, 2019 - 6:26:11 PM

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  • HAL Id : hal-00322079, version 1

Citation

T.H. Dao, Marie-Estelle Gueunier-Farret, D. Daineka, P. Bulkin, Pere Roca I Cabarrocas, et al.. Effect of thermal coupling on the electronic properties of hydrogenated amorphous silicon thin films deposited by ECR. Thin Solid Films, Elsevier, 2007, 515, pp.7650-7653. ⟨hal-00322079⟩

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