Distributed Electron Cyclotron Resonance plasma: a technology for large area deposition of device quality a-Si:H at very high rate

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https://hal-supelec.archives-ouvertes.fr/hal-00322305
Contributor : Olivier Schneegans <>
Submitted on : Wednesday, September 17, 2008 - 11:38:34 AM
Last modification on : Wednesday, February 27, 2019 - 11:04:02 AM

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  • HAL Id : hal-00322305, version 1

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P. Leempoel, P. Descamps, T. Kervyn de Meerenedre, J. Charliac, Pere Roca I Cabarrocas, et al.. Distributed Electron Cyclotron Resonance plasma: a technology for large area deposition of device quality a-Si:H at very high rate. E-MRS 2007 Spring Meeting, 2007, France. ⟨hal-00322305⟩

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