Submicro- and nanostructural effects on electrical properties of Li0.2V2O5 thin films obtained by atomic layer deposition (ALD)

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https://hal-supelec.archives-ouvertes.fr/hal-00325014
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Submitted on : Thursday, September 25, 2008 - 7:31:27 PM
Last modification on : Thursday, July 4, 2019 - 11:00:03 AM

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  • HAL Id : hal-00325014, version 1

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Jean-Claude Badot, A. Mantoux, Noël Baffier, Olivier Dubrunfaut, Daniel Lincot. Submicro- and nanostructural effects on electrical properties of Li0.2V2O5 thin films obtained by atomic layer deposition (ALD). Journal of Physics and Chemistry of Solids, Elsevier, 2006, 67, pp.1270-1274. ⟨hal-00325014⟩

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