High diffusion length silicon germanium alloy thin films deposited by pulsed rf PECVD method

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https://hal-supelec.archives-ouvertes.fr/hal-00350868
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Submitted on : Wednesday, January 7, 2009 - 4:56:01 PM
Last modification on : Monday, December 17, 2018 - 1:23:12 AM

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  • HAL Id : hal-00350868, version 1

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P. Chaudhuri, A. Bhaduri, A. Bandyopadhyay, S. Vignoli, P.P. Ray, et al.. High diffusion length silicon germanium alloy thin films deposited by pulsed rf PECVD method. Journal of Non-Crystalline Solids, Elsevier, 2008, 354, pp.2105. ⟨hal-00350868⟩

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