Distributed Electron Cyclotron Resonance plasma: a technology for large area deposition of device quality a-Si:H at very high rate

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https://hal-supelec.archives-ouvertes.fr/hal-00350890
Contributor : Olivier Schneegans <>
Submitted on : Wednesday, January 7, 2009 - 5:11:36 PM
Last modification on : Wednesday, February 27, 2019 - 11:04:02 AM

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P. Leempoel, P. Descamps, T. Kervyn de Meerendré, J. Charliac, Pere Roca I Cabarrocas, et al.. Distributed Electron Cyclotron Resonance plasma: a technology for large area deposition of device quality a-Si:H at very high rate. Thin Solid Films, Elsevier, 2008, 516, pp.6853. ⟨hal-00350890⟩

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