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Structural and optoelectronic properties of SiGe alloy thin films deposited by pulsed RF plasma CVD

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https://hal-supelec.archives-ouvertes.fr/hal-00350895
Contributor : Olivier Schneegans <>
Submitted on : Wednesday, January 7, 2009 - 5:21:20 PM
Last modification on : Wednesday, October 21, 2020 - 2:01:34 PM

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  • HAL Id : hal-00350895, version 1

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A. Bhaduri, P. Chaudhuri, D.L. Williamson, S. Vignoli, P.P. Ray, et al.. Structural and optoelectronic properties of SiGe alloy thin films deposited by pulsed RF plasma CVD. Journal of Applied Physics, American Institute of Physics, 2008, 104, pp.063709. ⟨hal-00350895⟩

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