Structural and optoelectronic properties of SiGe alloy thin films deposited by pulsed RF plasma CVD

Document type :
Journal articles
Complete list of metadatas

https://hal-supelec.archives-ouvertes.fr/hal-00350895
Contributor : Olivier Schneegans <>
Submitted on : Wednesday, January 7, 2009 - 5:21:20 PM
Last modification on : Monday, December 10, 2018 - 1:17:52 AM

Identifiers

  • HAL Id : hal-00350895, version 1

Citation

A. Bhaduri, P. Chaudhuri, D.L. Williamson, S. Vignoli, P.P. Ray, et al.. Structural and optoelectronic properties of SiGe alloy thin films deposited by pulsed RF plasma CVD. Journal of Applied Physics, American Institute of Physics, 2008, 104, pp.063709. ⟨hal-00350895⟩

Share

Metrics

Record views

93