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Electrical properties of V2O5 thin films obtained by Atomic Layer Deposition (ALD)

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https://hal-supelec.archives-ouvertes.fr/hal-00352361
Contributor : Thierry Leblanc <>
Submitted on : Monday, January 12, 2009 - 6:21:51 PM
Last modification on : Thursday, June 17, 2021 - 3:48:40 AM

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  • HAL Id : hal-00352361, version 1

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Jean-Claude Badot, A. Mantoux, Noël Baffier, Olivier Dubrunfaut, Daniel Lincot. Electrical properties of V2O5 thin films obtained by Atomic Layer Deposition (ALD). Journal of Materials Chemistry, Royal Society of Chemistry, 2004, 14, pp.3411-3415. ⟨hal-00352361⟩

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