Electrical properties of V2O5 thin films obtained by Atomic Layer Deposition (ALD)

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https://hal-supelec.archives-ouvertes.fr/hal-00352361
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Submitted on : Monday, January 12, 2009 - 6:21:51 PM
Last modification on : Thursday, July 4, 2019 - 11:00:04 AM

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  • HAL Id : hal-00352361, version 1

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Jean-Claude Badot, A. Mantoux, Noël Baffier, Olivier Dubrunfaut, Daniel Lincot. Electrical properties of V2O5 thin films obtained by Atomic Layer Deposition (ALD). Journal of Materials Chemistry, Royal Society of Chemistry, 2004, 14, pp.3411-3415. ⟨hal-00352361⟩

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