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Conference papers

Argon dilution as an alternative to hydrogen dilution for thin films deposition by rf-PECVD

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https://hal-supelec.archives-ouvertes.fr/hal-00446002
Contributor : Olivier Schneegans <>
Submitted on : Monday, January 11, 2010 - 5:00:59 PM
Last modification on : Thursday, June 17, 2021 - 3:49:55 AM

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  • HAL Id : hal-00446002, version 1

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Christophe Longeaud, P. Chaudhuri. Argon dilution as an alternative to hydrogen dilution for thin films deposition by rf-PECVD. 18th International photovoltaic science and engineering conference, 2009, Kolkata, India. pp.CD-Rom Proceedings. ⟨hal-00446002⟩

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