Argon dilution as an alternative to hydrogen dilution for thin films deposition by rf-PECVD

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Conference papers
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https://hal-supelec.archives-ouvertes.fr/hal-00446002
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Submitted on : Monday, January 11, 2010 - 5:00:59 PM
Last modification on : Saturday, November 24, 2018 - 1:30:25 AM

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Christophe Longeaud, P. Chaudhuri. Argon dilution as an alternative to hydrogen dilution for thin films deposition by rf-PECVD. 18th International photovoltaic science and engineering conference, 2009, Kolkata, India. pp.CD-Rom Proceedings. ⟨hal-00446002⟩

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