Optimized GaAs High Contrast Grating Design and Fabrication for Mid-infrared Application at 2.3 μm

Christyves Chevallier; Nicolas Fressengeas; Frédéric Genty; Joel Jacquet; Youness Laaroussi; Guilhem Almuneau; Dorian Sanchez; Laurent Cerutti; Thierry Taliercio

Optimized GaAs High Contrast Grating Design and Fabrication for Mid-infrared Application at 2.3 μm

Christyves Chevallier ¹ Nicolas Fressengeas ¹ Frédéric Genty ¹ Joel Jacquet ¹ Youness Laaroussi ² Guilhem Almuneau ² Dorian Sanchez ³ Laurent Cerutti ^{3, 4} Thierry Taliercio ^{3, 4}

1 LMOPS - Laboratoire Matériaux Optiques, Photonique et Systèmes

2 LAAS - Laboratoire d'analyse et d'architecture des systèmes [Toulouse]

3 IES - Institut d’Electronique et des Systèmes

4 NANOMIR - Composants à Nanostructure pour le moyen infrarouge

IES - Institut d’Electronique et des Systèmes

Abstract : A GaAs high contrast grating design has been optimized for a mid-infrared VCSEL application through the use of an optimization algorithm. Reflection spectra of an experimental grating with dimensions within the computed tolerances are in a correct agreement with the simulations.

Keywords : Gratings Mirrors Optical design and fabrication

Document type :

Conference papers

Domain :

Physics [physics] / Physics [physics] / Optics [physics.optics]

Complete list of metadatas

https://hal-supelec.archives-ouvertes.fr/hal-00642181
Contributor : Christyves Chevallier <>
Submitted on : Thursday, November 17, 2011 - 3:14:16 PM
Last modification on : Wednesday, June 26, 2019 - 1:16:04 PM

Optimized GaAs High Contrast Grating Design and Fabrication for Mid-infrared Application at 2.3 μm

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Optimized GaAs High Contrast Grating Design and Fabrication for Mid-infrared Application at 2.3 μm

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