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Growth and transport properties of HT-LixCoO2 thin films deposited by pulsed laser deposition

Efthymios Svoukis G.I. Athanasopoulos Alec Moradpour Olivier Schneegans 1 Alexandre Revcolevschi John Giapintzakis
1 CE - Equipe Contacts Electriques
LGEP - Laboratoire de génie électrique de Paris
Abstract : The successful in situ growth of single phase, c-axis oriented, layered structured LixCoO2 thin films on (0 0 0 1) Al2O3 substrates by pulsed laser deposition is reported. Thin films were grown in an oxygen pressure of 1 mbar and substrate temperatures varying from 300 up to 600 °C. It is found that the surface roughness and electrical resistance of the films depends strongly on the deposition temperatures.
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https://hal-supelec.archives-ouvertes.fr/hal-00777867
Contributor : Olivier Schneegans <>
Submitted on : Friday, January 18, 2013 - 11:48:37 AM
Last modification on : Thursday, June 17, 2021 - 3:47:08 AM

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CNRS | SORBONNE-UNIVERSITE | SUP_CE | SUP_LGEP | UPMC | SUPELEC | EC-PARIS

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Efthymios Svoukis, G.I. Athanasopoulos, Alec Moradpour, Olivier Schneegans, Alexandre Revcolevschi, et al.. Growth and transport properties of HT-LixCoO2 thin films deposited by pulsed laser deposition. Applied Surface Science, Elsevier, 2012, 258 (23), pp.9366-9369. ⟨10.1016/j.apsusc.2012.02.086⟩. ⟨hal-00777867⟩

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