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Tailored Voltage deposition of µc-Si1-xCx:H from H2 diluted SiH4 and CH4 gas mixtures

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https://hal-supelec.archives-ouvertes.fr/hal-00931312
Contributor : Thierry Leblanc <>
Submitted on : Wednesday, January 15, 2014 - 11:29:52 AM
Last modification on : Wednesday, April 8, 2020 - 3:38:54 PM

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  • HAL Id : hal-00931312, version 1

Citation

Sofia Gaiaschi, R. Ruggeri, E.V. Johnson, Marie-Estelle Gueunier-Farret, Christophe Longeaud, et al.. Tailored Voltage deposition of µc-Si1-xCx:H from H2 diluted SiH4 and CH4 gas mixtures. ICANS 25, Aug 2013, Toronto, Canada. ⟨hal-00931312⟩

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