Invention of the integrated circuit, IEEE Transactions on Electron Devices, vol.23, issue.7, p.648, 1976. ,
DOI : 10.1109/T-ED.1976.18467
Three-electrode circuit element utilizing semiconductive materials, U. S. Patent, p.2525035, 1948. ,
Cramming More Components Onto Integrated Circuits, Proceedings of the IEEE, vol.86, issue.1, 1965. ,
DOI : 10.1109/JPROC.1998.658762
Principle of lithography, 2001. ,
Projection optical lithography, Materials Today, vol.8, issue.2, p.18, 2005. ,
DOI : 10.1016/S1369-7021(05)00698-X
URL : http://doi.org/10.1016/s1369-7021(05)00698-x
Optical lithography???present and future challenges, Comptes Rendus Physique, vol.7, issue.8, p.858, 2006. ,
DOI : 10.1016/j.crhy.2006.10.005
Thèse de doctorat : Conception, montage et caractérisation d'un interférom` etre achromatique pour l'´ etude de la lithographie a immersion a 193 nm, 2006. ,
Immersion liquids for lithography in the deep ultraviolet, Optical Microlithography XVI, p.690, 2003. ,
DOI : 10.1117/12.485329
Double patterning lithography for DRAM. Solid State Technol, 2007. ,
Positive and negative tone double patterning lithography for 50 nm flash memory, Proc. SPIE, p.615410, 2006. ,
A litho-only approach to doubble patterning, Proc. SPIE, p.65302, 2007. ,
Extreme ultraviolet lithography, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol.16, issue.6 ,
DOI : 10.1116/1.590453
Thèse de doctorat : Limitations des résinesrésines`résinesà amplification chimique destinées destinées`destinéesà la réalisation du noeud technologique de 32 nm, 2006. ,
Thèse de doctorat : Influence des défauts enterrés dans les masques pour la lithographie extrême ultra-violet, 2006. ,
Direct write lithography: the global solution for R&D and manufacturing, Comptes Rendus Physique, vol.7, issue.8, p.910, 2006. ,
DOI : 10.1016/j.crhy.2006.10.003
Multiple electron-beam lithography, Microelectronic Engineering, vol.57, issue.58, pp.57-58, 2001. ,
DOI : 10.1016/S0167-9317(01)00528-7
Recent progress in nanoimprint technology and its applications, Journal of Physics D: Applied Physics, vol.37, issue.11, pp.123-141, 2004. ,
DOI : 10.1088/0022-3727/37/11/R01
Imprint of sub???25 nm vias and trenches in polymers, Applied Physics Letters, vol.67, issue.21, p.3114, 1995. ,
DOI : 10.1063/1.114851
Sub-10 nm imprint lithography and applications, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol.15, issue.6, p.2897, 1997. ,
DOI : 10.1116/1.589752
Mold-assisted nanolithography: A process for reliable pattern replication, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol.14, issue.6, p.4124, 1996. ,
DOI : 10.1116/1.588604
Step and flash imprint lithography: a new approach to high-resolution patterning, Emerging Lithographic Technologies III, p.379, 1999. ,
DOI : 10.1117/12.351155
Full wafer scale near zero residual nano-imprinting lithography using UV curable monomer solution, Microelectronic Engineering, vol.77, issue.1, pp.42-47, 2004. ,
DOI : 10.1016/j.mee.2004.08.008
Polymer Science in Nanoimprint Lithography, Journal of Photopolymer Science and Technology, vol.18, issue.4, pp.551-558, 2005. ,
DOI : 10.2494/photopolymer.18.551
Investigation of Application Availability of UV-NIL by Using Several Types of Photo-curable Resin, Journal of Photopolymer Science and Technology, vol.18, issue.4, pp.531-526, 2005. ,
DOI : 10.2494/photopolymer.18.531
Step and repeat UV-nanoimprint lithography using a large area stamp, Emerging Lithographic Technologies IX, pp.227-235, 2005. ,
DOI : 10.1117/12.598657
Status and prospects of UV-Nanoimprint technology, Microelectronic Engineering, vol.83, issue.4-9, pp.827-830, 2006. ,
DOI : 10.1016/j.mee.2006.01.220
Improving resolution in photolithography with a phase-shifting mask, IEEE Transactions on Electron Devices, vol.29, issue.12, p.1828, 1982. ,
DOI : 10.1109/T-ED.1982.21037
Distortion and overlay performances of UV step and flash imprint lithography, Microelectron. Eng, pp.78-79, 2005. ,
Prediction of fabrication distortions in step and flash imprint lithography templates, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol.20, issue.6, p.2891, 2002. ,
DOI : 10.1116/1.1521743
Inspection of templates for imprint lithography, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol.22, issue.6, p.3300, 2004. ,
DOI : 10.1116/1.1813456
Advanced mask metrology enabling characterization of imprint lithography templates, Metrology, Inspection, and Process Control for Microlithography XIX, p.384, 2005. ,
DOI : 10.1117/12.603718
Direct die-todatabase electron beam inspection of fused silica imprint templates, J. Vac. Sci. Technol. B, issue.6, pp.24-2979, 2006. ,
Repair of step and flash imprint lithography templates, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol.22, issue.6, pp.22-3306, 2004. ,
DOI : 10.1116/1.1815300
Structure and stability characterization of anti-adhesion self-assembled monolayers formed by vapour deposition for NIL use, Emerging Lithographic Technologies XI, 2007. ,
DOI : 10.1117/12.711417
Adhesion between template materials and UV-cured nanoimprint resits, Proc. of SPIE, p.61531, 2006. ,
DOI : 10.1116/1.2746336
Multiple imprinting in UV-based nanoimprint lithography: related material issues, Microelectronic Engineering, vol.61, issue.62, pp.61-62, 2002. ,
DOI : 10.1016/S0167-9317(02)00470-7
Influence of the molecular weight and imprint conditions on the formation of capillary bridges in nanoimprint lithography, Nanotechnology, vol.17, issue.16, p.4082, 2006. ,
DOI : 10.1088/0957-4484/17/16/015
URL : https://hal.archives-ouvertes.fr/hal-00385747
Investigation of capillary bridges growth in NIL process, Microelectronic Engineering, vol.84, issue.5-8, p.940, 2007. ,
DOI : 10.1016/j.mee.2007.01.134
URL : https://hal.archives-ouvertes.fr/hal-00385784
Polymer Imprint Lithography with Molecular-Scale Resolution, Nano Letters, vol.4, issue.12, p.2467, 2004. ,
DOI : 10.1021/nl048355u
Evaluation of quartz dry atching profile for the PSM lithography performance, Proc. SPIE, p.223, 2005. ,
Plasma etching of Cr photomasks: parametric comparisons of plasma sources and process conditions, Photomask and X-Ray Mask Technology IV, p.11, 1997. ,
DOI : 10.1117/12.277267
Plasma etch of binary Cr masks : CD uniformity study of photomasks utilizing varying Cr loads, Proc. SPIE, p.93, 1999. ,
Chrome etch for < 0.13 µm advanced reticle production, Proc. SPIE, p.633, 2002. ,
Fabrication of step and flash imprint lithography templates using commercial mask processes, Proc.SPIE, p.1019, 2003. ,
Cr absorber etch process for extreme ultraviolet lithography mask fabrication, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol.19, issue.6, p.2906, 2001. ,
DOI : 10.1116/1.1414013
New methods for fabricating step and flash imprint lithography templates, Proc.SPIE, p.176, 2002. ,
Step and flash imprint lithography template characterization, from an etch perspective, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol.21, issue.6 ,
DOI : 10.1116/1.1629299
High resolution templates for step and flash imprint lithography, J. Microlith., Microfab., Micorsyst, vol.1, issue.3, p.284, 2002. ,
Initial study of the fabrication of step and flash BIBLIOGRAPHIE imprint lithography templates for the printing of contact holes, J. Microlith., Microfab., Micorsyst, vol.3, issue.2, p.316, 2004. ,
Characterization of and imprint results using indium tin oxide-based step and flash imprint lithography templates, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol.20, issue.6, p.2857, 2002. ,
DOI : 10.1116/1.1520575
Nano-imprint lithography: Templates, imprinting and wafer pattern transfer, Microelectronic Engineering, vol.83, issue.4-9, p.929, 2006. ,
DOI : 10.1016/j.mee.2006.01.075
Fabrication of multi-tiered structures on step and flash imprint lithography templates, Microelectronic Engineering, vol.67, issue.68, pp.67-68, 2003. ,
DOI : 10.1016/S0167-9317(03)00075-3
Improved step and flash imprint lithography templates for nanofabrication, Microelectronic Engineering, vol.69, issue.2-4, p.412, 2003. ,
DOI : 10.1016/S0167-9317(03)00329-0
Image placement issues for ITO-based step and flash imprint lithography templates, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol.22, issue.2, p.695, 2004. ,
DOI : 10.1116/1.1667512
Indium tin oxide template development for step and flash imprint lithography, Emerging Lithographic Technologies IX, p.986, 2005. ,
DOI : 10.1117/12.606102
Hydrogen silsesquioxane for direct electron-beam patterning of step and flash imprint lithography templates, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol.20, issue.6, p.2896, 2002. ,
DOI : 10.1116/1.1515311
Thèse de doctorat : Gravure et traitement par plasma de matériaux organosiliciés SiOC(H) pour des applications en lithographie avancée et comme isolant d'interconnexion en microélectronique, 2004. ,
Nano-patterning of a hydrogen silsesquioxane resist with reduced linewidth fluctuations, Microelectronic Engineering, vol.41, issue.42, p.331, 1998. ,
DOI : 10.1016/S0167-9317(98)00076-8
Sub-10nm linewidth and overlay performance achieved with a fine-tuned EBPG-5000 TFE Electron Beam Lithography system ,
Direct imprint of sub-10???nm features into metal using diamond and SiC stamps, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol.22, issue.6, p.3257, 2004. ,
DOI : 10.1116/1.1825010
HSQ hybrid lithography for 20 nm CMOS devices development, Microelectronic Engineering, vol.61, issue.62, pp.61-62, 2002. ,
DOI : 10.1016/S0167-9317(02)00574-9
URL : https://hal.archives-ouvertes.fr/hal-00475891
Thèse de doctorat : ContributionsàContributions`Contributionsà la conception etàet`età la réalisation de transistor MOSàMOS`MOSà grille multiple, Université des sciences et technologies de, 2006. ,
Fabrication and characterisation of nanoscale programmed defects for EUV lithography, Microelectronic Engineering, vol.83, issue.4-9, p.926, 2006. ,
DOI : 10.1016/j.mee.2006.01.210
High-resolution hybrid lithography with negative tone chemically amplified resists, Jap. J ,
DOI : 10.1143/jjap.43.3974
URL : https://hal.archives-ouvertes.fr/hal-00385729
Microfabrication of Anti-Reflective Chromium Mask by Gas Plasma, Japanese Journal of Applied Physics, vol.15, issue.S1, p.25, 1976. ,
DOI : 10.7567/JJAPS.15S1.25
Plasma etching characteristics of chromium film and its novel etching mode, Journal of Vacuum Science and Technology, vol.17, issue.6, p.1351, 1980. ,
DOI : 10.1116/1.570669
Thèse de doctorat : Etude et caractérisation avancées des procédés plasma pour les technologies sub-0.1 µm, 2003. ,
Simulation of fluid flow in the step and flash imprint lithography process, Microelectronic Engineering, vol.82, issue.1, pp.60-70, 2005. ,
DOI : 10.1016/j.mee.2005.06.002
Importance of evaporation in the design of materials for step and flash imprint lithography, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol.23, issue.4, pp.1515-1520, 2005. ,
DOI : 10.1116/1.1990162
Predicting the fluid behavior during the dispensing process for step-and-flash imprint lithography, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol.22, issue.6 ,
DOI : 10.1116/1.1825016
Polymérisation sous rayonnement UV. Techniques de l'ingénieur -Dossier AM3044, 2000. ,
Physique des polymères -Tome 1 : Structure, fabrication, emploi. Hermann Editeurs, 2005. ,
Wafer scale patterning by soft UV-Nanoimprint Lithography, Microelectronic Engineering, vol.73, issue.74, pp.73-74, 2004. ,
DOI : 10.1016/S0167-9317(04)00093-0
Large scale ultraviolet-based nanoimprint lithography, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol.21, issue.6, p.2760, 2003. ,
DOI : 10.1116/1.1627816
Ellipsométrie -Théorie, 2003. ,
Infrared absorption spectroscopy 2nd Edition, 1977. ,
Surfaces, Langmuir, vol.21, issue.25, pp.11795-11801, 2003. ,
DOI : 10.1021/la0516330
URL : https://hal.archives-ouvertes.fr/hal-00818070
Thèse de doctorat préparée au cea-leti : Mesure des propriétés mécaniques de films de polymère ultra minces dans le cadre de la lithographie par nanoimpression, 2008. ,
Diffusion and Viscosity in a Crowded Environment:?? from Nano- to Macroscale, The Journal of Physical Chemistry B, vol.110, issue.51, pp.25593-25597, 2006. ,
DOI : 10.1021/jp0666784
Viscosity Measurements of Very Thin Polymer Films, Macromolecules, vol.38, issue.12, pp.5144-5151, 2005. ,
DOI : 10.1021/ma050440g
Limits to etch resistance for 193-nm single-layer resists, Advances in Resist Technology and Processing XIII, pp.2724-365, 1996. ,
DOI : 10.1117/12.241835
Dry Etch Resistance of Organic Materials, Journal of The Electrochemical Society, vol.130, issue.1, p.143, 1983. ,
DOI : 10.1149/1.2119642
Oxygen ion-beam etch resistance of metal-free and organosilicon resist materials, Microelectronic Engineering, vol.1, issue.4, p.251, 1983. ,
DOI : 10.1016/0167-9317(83)90015-1
Study of organic polymer thin-film etching by plasma beam irradiation, Journal of Applied Physics, vol.98, issue.8, p.84907, 2005. ,
DOI : 10.1063/1.2113410
Investigation of surface modifications of 193 nm and 248 nm photoresist materials during low-pressure plasma etching, The 31st IEEE International Conference on Plasma Science, 2004. ICOPS 2004. IEEE Conference Record, Abstracts., p.2594, 2004. ,
DOI : 10.1109/PLASMA.2004.1339719
Step and Repeat UV nanoimprint lithography tools and processes, Emerging Lithographic Technologies VIII, p.222, 2004. ,
DOI : 10.1117/12.538733
Vinyl ethers in ultraviolet curable formultations for step and flash imprint lithography, J ,
S-FIL technology: cost of ownership case study, Emerging Lithographic Technologies IX, p.964, 2005. ,
DOI : 10.1117/12.599921
Esca applied to polymers. XXIII. RF glow discharge modification of polymers in pure oxygen and helium???oxygen mixtures, Journal of Polymer Science: Polymer Chemistry Edition, vol.17, issue.4, p.957, 1979. ,
DOI : 10.1002/pol.1979.170170404
x???ray photoelectron spectroscopy studies of polymer surface modifications by a remote oxygen plasma treatment, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, vol.12, issue.4, p.2491, 1994. ,
DOI : 10.1116/1.579199
The investigation of argon plasma surface modification to polyethylene: Quantitative ATR-FTIR spectroscopic analysis, European Polymer Journal, vol.42, issue.7, p.1625, 2006. ,
DOI : 10.1016/j.eurpolymj.2006.01.007
Plasma treatment of polymers Effects of energy transfer from an argon plasma on the surface chemistry of poly(styrene), low density poly(ethylene), poly(propylene) and poly(ethylene terephthalate), Journal of the Chemical Society, Faraday Transactions, vol.93, issue.17, pp.93-3171, 1997. ,
DOI : 10.1039/a702311a
Characterization of resist-trimming processes by quasi in situ x-ray photoelectron spectroscopy, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol.22, issue.4, p.1869, 2004. ,
DOI : 10.1116/1.1767038
URL : https://hal.archives-ouvertes.fr/hal-00384173
Mass spectrometry studies of resist trimming processes in HBr???O[sub 2] and Cl[sub 2]???O[sub 2] chemistries, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol.23, issue.1, p.103, 2005. ,
DOI : 10.1116/1.1839915
Handbook of X-ray Photoelectrons Spectroscopy, 1992. ,
High Resolution XPS of organic polymers, 1992. ,
Plasma modification of polymethylmethacrylate and polyethyleneterephthalate surfaces, Journal of Applied Physics, vol.76, issue.2, p.887, 1994. ,
DOI : 10.1063/1.357765
Interaction of low-energy ions (< 10 eV) with polymethylmethacrylate during plasma treatment, Applied Surface Science, vol.89, issue.1, p.83, 1995. ,
DOI : 10.1016/0169-4332(95)00013-5
XPS and atomic force microscopy of plasma-treated polysulfone, Journal of Polymer Science Part A: Polymer Chemistry, vol.34, issue.8, p.1385, 1996. ,
DOI : 10.1002/(SICI)1099-0518(199606)34:8<1385::AID-POLA1>3.0.CO;2-#
Roughness evolution in polyimide films during plasma etching, Applied Physics Letters, vol.78, issue.16, p.2294, 2001. ,
DOI : 10.1063/1.1364507
Plasma on Polyimide Etching, Japanese Journal of Applied Physics, vol.39, issue.Part 1, No. 12B, p.7011, 2000. ,
DOI : 10.1143/JJAP.39.7011
Surface modification of polymer nanofibres by plasma treatment, Applied Surface Science, vol.245, issue.1-4, p.16, 2004. ,
DOI : 10.1016/j.apsusc.2004.10.013
Modification of the micro- and nanotopography of several polymers by plasma treatments, Applied Surface Science, vol.207, issue.1-4, p.276, 2003. ,
DOI : 10.1016/S0169-4332(02)01503-9
Surface Modification of Positive Photoresist Mask during Reactive Ion Etching of Si and W in SF[sub 6] Plasma, Journal of The Electrochemical Society, vol.138, issue.1, p.284, 1991. ,
DOI : 10.1149/1.2085556
An XPS study of photoresist surfaces in SF 6 -O 2 r.f. plasma, Materials Science and Engineering, p.385, 1991. ,
Line edge roughness reduction by palsma curing photoresists, Proc. SPIE, p.380, 2005. ,
Effects of various plasma pretreatments on 193???nm photoresist and linewidth roughness after etching, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol.24, issue.6 ,
DOI : 10.1116/1.2366616
Changes of chemical nature of photoresists induced by various plasma treatments and their impact on LWR, Advances in Resist Technology and Processing XXIII, p.615319, 2006. ,
DOI : 10.1117/12.656002
Techniques de fabrication des microsystèmes 2 -Chapitre 5 : Technologies d'assemblage de tranches et procédés dérivés, pp.135-183, 2004. ,
Characterization of 8-in. wafers printed by nanoimprint lithography, Microelectronic Engineering, vol.73, issue.74, pp.73-74, 2004. ,
DOI : 10.1016/S0167-9317(04)00094-2
Impact of planarization sheet addition on full wafer printing uniformity, MRS Proceedings, vol.961, pp.961-963, 2007. ,
DOI : 10.1116/1.2130345
Mathematical theory of elastic structures, 1981. ,
DOI : 10.1007/978-3-662-03286-2